To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...

To store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be ...

and a dental porcelain etching gel — against a 300 nm silicon dioxide layer. Etch speed varied widely, from rust remover’s 10 nm/min to glass etching cream’s blazing 240 nm/min — we wonder ...

The narrow, deep holes required for one type of flash memory are made twice as fast with the right recipe, which includes a ...

leading to faster and more uniform etching without the regrowth of silicon dioxide (SiO2) layers[1]. This approach addresses a common challenge in 3D NAND fabrication, where oxide regrowth can ...

After removing the bulk of the material, Ken uses a product called Armor Etch to remove some silicon dioxide. Armor Etch apparently comes from craft stores, used to etch glassware with silhouettes ...

For example, chlorine-based gases are commonly used for etching silicon, while fluorine-based gases are used for etching silicon dioxide and nitride. Wet etching involves the use of liquid chemical ...

The bits left in shadow stay soft. When an etching chemical is applied those soft parts, and the silicon dioxide underneath them, are removed. The hard photoresist is then dissolved, leaving a ...