To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...

and a dental porcelain etching gel — against a 300 nm silicon dioxide layer. Etch speed varied widely, from rust remover’s 10 nm/min to glass etching cream’s blazing 240 nm/min — we wonder ...

leading to faster and more uniform etching without the regrowth of silicon dioxide (SiO2) layers[1]. This approach addresses a common challenge in 3D NAND fabrication, where oxide regrowth can ...

The narrow, deep holes required for one type of flash memory are made twice as fast with the right recipe, which includes a ...

For example, chlorine-based gases are commonly used for etching silicon, while fluorine-based gases are used for etching silicon dioxide and nitride. Wet etching involves the use of liquid chemical ...

The bits left in shadow stay soft. When an etching chemical is applied those soft parts, and the silicon dioxide underneath them, are removed. The hard photoresist is then dissolved, leaving a ...

The researchers also studied the impact of phosphorus trifluoride, an essential ingredient when etching silicon dioxide at any significant degree. While it has been used before, the researchers ...